Controlling Reaction Selectivity on Photocatalysts with Area-Selective Atomic Layer Deposition
Author Information
Author(s): McNeary W. Wilson, Stinson William D. H., Waqar Moaz, Zang Wenjie, Pan Xiaoqing, Esposito Daniel V., Hurst Katherine E.
Primary Institution: National Renewable Energy Laboratory
Hypothesis
Can area-selective atomic layer deposition (AS-ALD) enhance reaction selectivity on dual-site electrocatalysts while maintaining high activity?
Conclusion
The study demonstrates that AS-ALD can significantly reduce undesired back reactions in dual-site photocatalytic systems, improving overall reaction selectivity.
Supporting Evidence
- AS-ALD effectively suppressed undesired H2 oxidation and Fe(II)/Fe(III) redox reactions.
- Interdigitated microelectrodes with AS-ALD coatings showed a 10-fold decrease in back reaction rates compared to uncoated controls.
- Electroanalytical measurements confirmed the selective deposition of TiO2 on specific catalytic sites.
Takeaway
This study shows a way to make photocatalysts work better by using a special coating that helps them focus on the right reactions and avoid unwanted ones.
Methodology
The study used area-selective atomic layer deposition (AS-ALD) to deposit TiO2 films on specific sites of metallic cocatalysts and characterized the results using electrochemical methods.
Limitations
The study primarily focuses on model systems, which may not fully represent the complexities of real-world photocatalytic systems.
Digital Object Identifier (DOI)
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