Improved Algorithm for Wafer-Mask Alignment in Nanoimprint Lithography
Author Information
Author(s): Xu Feifan, Ding Yinye, Chen Wenhao, Xia Haojie
Primary Institution: Hefei University of Technology
Hypothesis
Can an improved algorithm enhance the accuracy of phase extraction for wafer-mask alignment in nanoimprint lithography?
Conclusion
The proposed 2D-FWT algorithm achieves nanometer-level alignment accuracy, outperforming traditional methods.
Supporting Evidence
- The 2D-FWT algorithm improves alignment accuracy by 15.8% over 2D-FFT and 6.6% over 2D-WFF.
- The algorithm processes fringe patterns in real-time, achieving results in 0.26 seconds.
- Simulations confirm the robustness of the 2D-FWT algorithm under various noise conditions.
Takeaway
This study created a new way to measure how well two things line up using special patterns, making it super accurate, like measuring tiny distances.
Methodology
The study used simulations and experiments to validate the new phase extraction algorithm, comparing it with existing methods.
Limitations
The accuracy is affected by various errors, including fabrication and environmental factors.
Digital Object Identifier (DOI)
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